Mehrlagige Struktur, verwendet für Materialine mit hoher Permitivität

摘要

Multilayer structure used as a material having high permittivity comprises a number of layers each of thickness less than 500 Angstroms. Some of the layers are based on aluminum, hafnium and oxygen, notably hafnium dioxide (HfO2) and alumina (Al2O3). Preferably, these layers comprise mixed oxides of formula HfxAlyOz whose stoichiometry varies from one layer to another. ??Preferred Features: The thickness of each layer is 1-200 Angstrom , preferably 1-100 Angstrom , and most preferably 1-50 Angstrom . The structure comprises at least five layers. At least one of the external layers is alumina (Al2O3). Each layer is deposited by atomic layer deposition (ALD).