首页> 外国专利> Surface Treatment Compositions And Method For Removing Si Component And Reduced Metal Salt On The Aluminum Dicast Substrate In Etching Process

Surface Treatment Compositions And Method For Removing Si Component And Reduced Metal Salt On The Aluminum Dicast Substrate In Etching Process

机译:在蚀刻过程中去除铝铸铸基板上硅成分和还原金属盐的表面处理组合物和方法

摘要

PURPOSE: A surface treatment composition and a surface treatment method for removing silicon and reductive metallic salts generated during etching of an aluminum die casting material without generation of nitric acid gas (NOx) and hydrofluoric acid gas (HF) are provided. CONSTITUTION: In a surface treatment composition of an aluminum die casting material used in removing silicon and reductive metallic salts generated on the surface of the material after etching treatment of an aluminum die casting material, the surface treatment composition of the aluminum die casting material comprises 300 to 950 g/L of hydrogen peroxide, 1 to 300 g/L of organic salts containing fluorine ions selected from the group consisting of ammonium bifluoride (NH4HF2), ammonium fluoride (NH4F) and a mixture thereof, and a balance of water, wherein the surface treatment composition of the aluminum die casting material further comprises 1 to 3 g/L of aqueous ether selected from ethylene glycol monobutyl ether, dipropylene glycol monoethyl ether and a mixture thereof. The surface treatment method comprises the process of removing silicon and reductive metallic salts on the surface of the etched aluminum die casting material after etching the aluminum die casting material by dipping an aluminum die casting material into the surface treatment composition.
机译:目的:提供一种表面处理组合物和表面处理方法,用于除去在铝压铸材料的蚀刻过程中产生的硅和还原性金属盐,而不产生硝酸气体(NOx)和氢氟酸气体(HF)。组成:在压铸材料的表面处理组合物中,用于去除铝压铸材料经过蚀刻处理后在材料表面产生的硅和还原性金属盐,该铝压铸材料的表面处理组合物包含300 -950g / L的过氧化氢,1-300g / L的含氟离子的有机盐,其选自由氟化氢铵(NH4HF2),氟化铵(NH4F)及其混合物组成的组,以及余量的水,其中铝压铸材料的表面处理组合物还包含1至3g / L的选自乙二醇单丁醚,二丙二醇单乙醚及其混合物的水性醚。表面处理方法包括以下步骤:通过将铝压铸材料浸入表面处理组合物中,在蚀刻铝压铸材料之后,去除蚀刻的铝压铸材料表面上的硅和还原性金属盐。

著录项

  • 公开/公告号KR20030010464A

    专利类型

  • 公开/公告日2003-02-05

    原文格式PDF

  • 申请/专利权人 CHEON YOUNG CHEMICAL CO. LTD.;

    申请/专利号KR20020007084

  • 发明设计人 LEE EUL GYU;

    申请日2002-02-07

  • 分类号C23G1/12;

  • 国家 KR

  • 入库时间 2022-08-21 23:47:53

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