Mask for measuring flare method for fabricating the same method for measuring flare-affected range on a wafer and method for correcting patterns in flare-affected range using the same

摘要

PURPOSE: A mask for measuring flare is provided to determine whether flare of a lens occurs by performing a photolithography process while using a mask having a light blocking region and a light transmitting region which have a plurality of light transmitting patterns. CONSTITUTION: The light blocking region and the light transmitting region are defined on a mask substrate. A plurality of line patterns blocking light and a plurality of light transmitting patterns transmiting light are formed in the light blocking region and the light transmitting region, respectively. The line patterns and the light transmitting patterns correspond to each other in the light blocking region and the light transmitting region. The line patterns have the same line width. The light transmitting patterns have the same line width. The line transmitting pattern is a groove between the line patterns.