首页> 外国专利> Chemical Vapor Deposition equipment having a boat locking means method for fabricating a semiconductor device thereof

Chemical Vapor Deposition equipment having a boat locking means method for fabricating a semiconductor device thereof

机译:具有舟形锁定装置的化学气相沉积设备及其半导体器件的制造方法

摘要

PURPOSE: A CVD(Chemical Vapor Deposition) equipment having a latch for locking a boat and a method for manufacturing a semiconductor device using the same are provided to be capable of preventing the generation of particles by improving the connecting state between a boat and a boat cap by using a latch. CONSTITUTION: A CVD equipment is provided with cylindrical heater part, an outer tube having a closed upper portion located in the heater part, an inner tube having an opened upper portion located in the outer tube, a boat loaded into the inner tube, and a loader part having a boat cap(100) capable of loading the boat on the upper portion of the boat cap. The boat cap(100) further includes a plurality of fixing pins(110,120) and a latch(112) formed at the fixing pin(110) for completely locking the boat and boat cap. Preferably, the fixing pins are located at the edge portion of the boat cap.
机译:目的:提供一种具有用于锁定舟皿的闩锁的CVD(化学气相沉积)设备以及使用该设备的半导体器件的制造方法,该设备能够通过改善舟皿与舟皿之间的连接状态来防止颗粒的产生。通过使用闩锁盖。组成:CVD设备配备:圆柱形加热器部分,外管具有位于加热器部分中的封闭的上部,内管具有位于上部的敞开的上部,位于外管中,舟皿装载到内管中,装载机部件,其具有能够将船装载到船帽的上部的船帽(100)。船帽(100)还包括多个固定销(110,120)和形成在固定销(110)处的闩锁(112),用于完全锁定船和船帽。优选地,固定销位于船帽的边缘部分。

著录项

  • 公开/公告号KR20030047076A

    专利类型

  • 公开/公告日2003-06-18

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20010077458

  • 发明设计人 KIM HYEONG JUN;

    申请日2001-12-07

  • 分类号H01L21/205;

  • 国家 KR

  • 入库时间 2022-08-21 23:46:57

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