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Chemical Vapor Deposition equipment having a boat locking means method for fabricating a semiconductor device thereof
Chemical Vapor Deposition equipment having a boat locking means method for fabricating a semiconductor device thereof
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机译:具有舟形锁定装置的化学气相沉积设备及其半导体器件的制造方法
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摘要
PURPOSE: A CVD(Chemical Vapor Deposition) equipment having a latch for locking a boat and a method for manufacturing a semiconductor device using the same are provided to be capable of preventing the generation of particles by improving the connecting state between a boat and a boat cap by using a latch. CONSTITUTION: A CVD equipment is provided with cylindrical heater part, an outer tube having a closed upper portion located in the heater part, an inner tube having an opened upper portion located in the outer tube, a boat loaded into the inner tube, and a loader part having a boat cap(100) capable of loading the boat on the upper portion of the boat cap. The boat cap(100) further includes a plurality of fixing pins(110,120) and a latch(112) formed at the fixing pin(110) for completely locking the boat and boat cap. Preferably, the fixing pins are located at the edge portion of the boat cap.
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