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Method of manufacturing of wave optics experimental slit

机译:波动光学实验狭缝的制造方法

摘要

PURPOSE: A wave optics experimental slit is provided to manufacture a slit of a uniform width and interval to accurately recognize the location and the strength of the diffraction and the interference. CONSTITUTION: A slit is drawn on a monitor with a line or a circle by using a computer and a program. A print film which does not pass the light is introduced into an output device and is exposed by a laser light for a predetermined period of time, and the slit is positively photographed. Then, infrared rays are irradiated by an infrared lamp, and is converted to negative.
机译:目的:提供一个波光学实验狭缝,以制造出宽度和间隔均匀的狭缝,以准确识别衍射和干涉的位置和强度。构成:使用计算机和程序在监视器上用直线或圆画一条缝。将不通过光的打印膜引入输出装置,并在预定时间段内用激光曝光,并对狭缝进行正片照相。然后,红外线被红外线灯照射,并转换为负光。

著录项

  • 公开/公告号KR100374039B1

    专利类型

  • 公开/公告日2003-02-26

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20000017190

  • 发明设计人 오철한;임종탁;

    申请日2000-04-01

  • 分类号G02B27/00;

  • 国家 KR

  • 入库时间 2022-08-21 23:45:40

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