首页> 外国专利> Apparatus for heating substrates comprises emitters for emitting electromagnetic waves, reflectors for (in)directly directing electromagnetic radiation released by emitters onto substrate, and rigid or adjustable screens

Apparatus for heating substrates comprises emitters for emitting electromagnetic waves, reflectors for (in)directly directing electromagnetic radiation released by emitters onto substrate, and rigid or adjustable screens

机译:用于加热基板的设备包括用于发射电磁波的发射器,用于将发射器释放的电磁辐射直接(间接)引导到基板上的反射器,以及刚性或可调节的屏幕

摘要

An apparatus for heating substrates comprises one or more emitters (1) for emitting electromagnetic waves in the region of 200-10000 nm; one or more reflectors (2) for (in)directly directing the electromagnetic radiation released by the emitters onto a substrate; and one or more rigid or adjustable screens (3) for electromagnetic radiation released by the emitters and/or reflectors in the direction of the substrate. Preferred Features: The width of the energy distribution of a homogeneous beam is in the region of 0.1-150, preferably 1-100, especially 4-60 mm, and the length of the energy distribution of a homogeneous beam is in the region of 0.1 mm -10 m, preferably 10 mm - 8 m, especially 20 mm - 6 m. The screens are mechanically, electrically, hydraulically and/or pneumatically adjusted. The screens have various geometries. The reflectors have a polygonal cross-section.
机译:一种用于加热基板的设备,包括:一个或多个发射器(1),用于发射200-10000 nm范围内的电磁波;一个或多个反射器(2),用于将由发射器释放的电磁辐射直接(间接)引导到基板上;一个或多个刚性或可调节的屏幕(3),用于由发射器和/或反射器在衬底的方向上释放的电磁辐射。优选特征:均匀光束的能量分布的宽度在0.1-150mm的范围内,优选为1-100mm,尤其是4-60mm,并且均匀光束的能量分布的长度在0.1mm的范围内。毫米-10 m,优选10毫米-8 m,特别是20毫米-6 m。筛网是机械,电动,液压和/或气动调节的。屏幕具有各种几何形状。反射器具有多边形的横截面。

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