Producing contact holes in integrated circuit involves using optical lithography with mask with elongated, slit-shaped openings for producing essentially circular and/or elongated holes

摘要

The method involves using a mask illuminated with short-wave light in an optical lithographic method. The mask has elongated, slit-shaped openings for producing essentially circular and/or elongated contact holes (2,6). The illumination conditions are selected so that an image reduction of at least 200 to 400 nm. occurs in the longitudinal direction of the openings.