首页> 外国专利> Method for non-destructive detection of cracks in silicon wafers and solar cells involves placement of the test item between a light source and an electronic camera so that light transmitted through any cracks can be detected

Method for non-destructive detection of cracks in silicon wafers and solar cells involves placement of the test item between a light source and an electronic camera so that light transmitted through any cracks can be detected

机译:用于无损检测硅片和太阳能电池中的裂纹的方法包括将测试项目放置在光源和电子照相机之间,以便可以检测到透射通过任何裂纹的光

摘要

Method for non-destructive and non-contact localization of cracks in silicon solar cells and silicon wafers uses an electronic camera to measure light transmitted through a wafer or cell. The light originates from a light source placed on the other side of the wafer or cell to the camera. The invention also relates to a corresponding device.
机译:用于对硅太阳能电池和硅晶片中的裂纹进行非破坏性和非接触式定位的方法,是使用电子相机测量通过晶片或电池传输的光。光来自放置在晶圆或电池另一侧的摄像头上的光源。本发明还涉及相应的设备。

著录项

  • 公开/公告号DE10146879A1

    专利类型

  • 公开/公告日2003-04-17

    原文格式PDF

  • 申请/专利权人 THERMOSENSORIK GMBH;

    申请/专利号DE2001146879

  • 发明设计人 SCHREER OLIVER;

    申请日2001-09-26

  • 分类号G01N21/88;

  • 国家 DE

  • 入库时间 2022-08-21 23:42:38

相似文献

  • 专利
  • 外文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号