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A method for producing an antiscatter grid or collimator

机译:一种制造防散射格栅或准直仪的方法

摘要

The present invention relates to a process for producing an antiscatter grid or collimator, for which any kind of the transparent regions (5) and impermeable regions (6) of predetermined geometry. In the method, the geometry of the transmissive (5) and the nontransmissive regions (6) of the antiscatter grid or collimator is initially set. On the basis of this geometry, a base (16) in accordance with the possibly differing by a particular layer thickness geometry of the transmissive regions (5) or the nontransmissive regions (6) by means of a rapid prototyping technique through layer-wise solidification of a structural material under the action of radiation is built up. On the basis of this base body (16) is finally the antiscatter grid or collimator is completed. Dollars a the present process makes it possible to the simple and cost effective production of scattered radiation grids or collimators with very filigree absorption structures. This makes possible a better utilization of the primary radiation in the case of the taking of an image.
机译:本发明涉及一种制造防散射栅格或准直仪的方法,针对该防散射栅格或准直仪具有预定几何形状的任何种类的透明区域(5)和不可渗透区域(6)。在该方法中,首先设置防散射栅格或准直仪的透射区域(5)和非透射区域(6)的几何形状。基于该几何形状,通过快速成型技术通过逐层固化,根据透射区域(5)或非透射区域(6)的特定的层厚度几何形状,可能具有不同的基底(16)在辐射作用下积累了一种结构材料。最后,在该基体(16)的基础上完成了防散射栅或准直仪。通过本发明的方法,可以简单且成本有效地生产具有非常细丝吸收结构的散射辐射栅格或准直仪。在拍摄图像的情况下,这可以更好地利用主辐射。

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