Production of chloromethylsilane compounds involves liquid phase photochlorination of corresponding methylsilane compound with substoichiometric amount of chlorine in presence of hydrogen chloride

摘要

Production of silanes (I) with 1-4 mono-, di- or tri-chloromethyl groups comprises reacting methylsilanes (II) with a substoichiometric amount of chlorine in the presence of = 0.1 wt.% hydrogen chloride with respect to (II) under electromagnetic radiation inducing chlorination and at temperatures below the boiling point of (II). Production of silanes of formula (ClCH(3-y))a(CH3)bSiCl(4-a-b) (I) comprises reacting methylsilanes of formula (CH3)(a+b)SiCl(4-a-b) (II) with a substoichiometric amount of chlorine in the presence of = 0.1 wt.% hydrogen chloride with respect to (II) under electromagnetic radiation inducing chlorination and at temperatures below the boiling point of (II): y = 1, 2 or 3; a = 1, 2, 3 or 4' b = 0, 1, 2 or 3; a+b = 1, 2, 3 or 4 An Independent claim is included for equipment for the production of silanes containing chloromethyl groups under electromagnetic radiation inducing chlorination, in which a tubular medium pressure mercury radiation source with a quartz protective tube and a covering tube of borosilicate glass is placed concentrically in a metallic outer tube, the educts and HCl flow upwards and flooded operation is used.