首页> 外国专利> Device for precision application of force to tools for polishing workpieces has first and second base plate movable relative to each other through known high precision guides and against force of compensating springs

Device for precision application of force to tools for polishing workpieces has first and second base plate movable relative to each other through known high precision guides and against force of compensating springs

机译:用于将力精确地施加到用于抛光工件的工具上的装置具有第一底板和第二底板,第一底板和第二底板可通过已知的高精度导向装置相对于补偿弹簧的力相对移动

摘要

The device has a first base plate (1) connected in force or keyed engagement with a spindle drive or similar and a second base plate (2) connected to the tool (5). The two plates can be moved relative to each other through at least a known high precision guide such as through several cylinder guides (3), and against the force of compensating springs (4). The springs are arranged in pairs to compensate radial, tangential and tilting forces. To prevent tilting moments during transfer of force the tool is housed in a domed bearing (7) of the second base plate.
机译:该装置具有以力或键配合方式与主轴驱动器或类似装置连接的第一基板(1)和连接至工具(5)的第二基板(2)。这两个板可以通过至少一个已知的高精度导向装置,例如通过多个气缸导向装置(3),并且克服补偿弹簧(4)的力而相对于彼此移动。弹簧成对布置,以补偿径向,切向和倾斜力。为了防止在力传递过程中产生倾斜力矩,将工具容纳在第二个基板的圆顶轴承(7)中。

著录项

相似文献

  • 专利
  • 外文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号