首页> 外国专利> Use of 3-arylphenyl-substituted cyclic ketoenol compounds as protectants for plants or materials, e.g. plastics, adhesives, paper, paints, lubricants, textiles and wood, against fungal, algal, viral and/or bacterial attack

Use of 3-arylphenyl-substituted cyclic ketoenol compounds as protectants for plants or materials, e.g. plastics, adhesives, paper, paints, lubricants, textiles and wood, against fungal, algal, viral and/or bacterial attack

机译:3-芳基苯基取代的环状酮烯醇化合物作为植物或材料的保护剂的用途。防止真菌,藻类,病毒和/或细菌侵袭的塑料,粘合剂,纸张,油漆,润滑剂,纺织品和木材

摘要

The use of 3-arylphenyl-substituted ketoenol compounds (I), in which the ketoenol residue is based on a pyrrole, furan, thiophene, cyclopentane or cyclohexane ring, for controlling undesirable fungi is new. The use of 3-arylphenyl-substituted cyclic ketoenol compounds of formula (I) for controlling undesirable fungi is new. X = halo, alkyl, alkoxy, haloalkyl, haloalkoxy, NO2 or CN; Z' = optionally substituted (os) aryl; W', Y' = H or as for X; R = cyclic keto-enol residue of formula (a) - (c); R' = N(D), O or S; A = H; alkyl, alkenyl, alkoxyalkyl, polyalkoxyalkyl or alkylthioalkyl (all os by halo); saturated or unsaturated cycloalkyl (os and optionally having at least one ring member replaced by a heteroatom); or aryl, aralkyl, aryl or heteroaryl (all os by halo, alkyl, haloalkyl, alkoxy, haloalkoxy, CN or NO2); A' = H or alkyl; or A + A' = os group completing a saturated or unsaturated ring, optionally containing at least one heteroatom; D' = H; alkyl, alkenyl, alkoxyalkyl, polyalkoxyalkyl or alkylthioalkyl (all os by halo); saturated or unsaturated cycloalkyl (optionally having at least one ring member replaced by a heteroatom); or aralkyl, aryl, heteroaralkyl or heteroaryl; or A + D' = os group completing a saturated or unsaturated ring, optionally containing at least one heteroatom; or A + D' = alkanediyl or alkenediyl (both os by alkyl, OH, alkoxy, alkoxy, alkylthio, cycloalkyl, benzyloxy or aryl (all os)); Q1, Q2, Q4 - Q6 = H or alkyl; Q3 = H; alkyl, alkoxyalkyl, alkylthioalkyl, os cycloalkyl (optionally having one CH2 replaced by O or S) or os phenyl; or Q3 + Q4 = os group completing a saturated or unsaturated ring, optionally containing at least one heteroatom; G = H, -COR1, -C(L)-M'R2, -SO2R3, -P(L)R4R5, E' or -C(L')-NR6R7; E' = 1 equivalent of a metal ion or ammonium ion; L', M'' = O or S; R1 = alkyl, alkenyl, alkoxyalkyl or polyalkoxyalkyl (all os by halo); cycloalkyl (os by halo, alkyl or alkoxy and optionally interrupted by at least one heteroatom); or phenyl, phenylalkyl, heteroaryl, phenoxyalkyl or heteroaryloxyalkyl (all os); R2 = alkyl, alkenyl, alkoxyalkyl, polyalkoxyalkyl, cycloalkyl phenyl or benzyl (all os); R3 - R5 = alkyl, alkoxy, alkylthio, mono- ore dialkylamino, alkylthio, alkenylthio or cycloalkylthio (all os by halo); or phenyl, benzyl, phenoxy or phenylthio (all os); R6, R7 = H; alkyl, cycloalkyl, alkenyl, alkoxy or alkoxyalkyl (all os by halo); or phenyl or benzyl (both os); and or NR6R7 = os ring (optionally interrupted by O or S).
机译:使用3-芳基苯基取代的酮烯醇化合物(I),其中酮烯醇残基基于吡咯,呋喃,噻吩,环戊烷或环己烷环,用于防治不良真菌是新的。式(I)的3-芳基苯基取代的环状酮烯醇化合物用于防治不良真菌的用途是新的。 X =卤素,烷基,烷氧基,卤代烷基,卤代烷氧基,NO2或CN; Z'=任选取代的(os)芳基; W',Y'= H或X; R =式(a)-(c)的环状酮-烯醇残基; R′= N(D),O或S; A = H;烷基,烯基,烷氧基烷基,聚烷氧基烷基或烷硫基烷基(所有的os为卤素);饱和或不饱和的环烷基(os和任选地具有至少一个被杂原子取代的环成员);或芳基,芳烷基,芳基或杂芳基(所有o为卤素,烷基,卤代烷基,烷氧基,卤代烷氧基,CN或NO 2);或A'= H或烷基;或A + A'= os基,其完成饱和或不饱和环,任选地包含至少一个杂原子; D'= H;烷基,烯基,烷氧基烷基,聚烷氧基烷基或烷硫基烷基(所有的os为卤素);饱和或不饱和的环烷基(任选地具有至少一个被杂原子取代的环成员);或芳烷基,芳基,杂芳烷基或杂芳基;或或A + D'=完整的饱和或不饱和环的os基,可选地包含至少一个杂原子;或或A + D′=链烷二基或链烯二基(两者均为烷基,OH,烷氧基,烷氧基,烷硫基,环烷基,苄氧基或芳基(全为os));或Q1,Q2,Q4-Q6 = H或烷基; Q3 = H;烷基,烷氧基烷基,烷硫基烷基,环烷基(任选地具有一个被O或S取代的CH 2)或苯基。或Q 3 + Q 4 =完成饱和或不饱和环的os基团,任选地包含至少一个杂原子;或G = H,-COR1,-C(L)-M'R2,-SO2R3,-P(L)R4R5,E'或-C(L')-NR6R7; E'= 1当量的金属离子或铵离子; L',M''= O或S; R1 =烷基,烯基,烷氧基烷基或聚烷氧基烷基(所有的os为卤素);环烷基(被卤素,烷基或烷氧基取代并且任选地被至少一个杂原子中断);或苯基,苯基烷基,杂芳基,苯氧基烷基或杂芳基氧基烷基(全部为os);或R 2 =烷基,烯基,烷氧基烷基,聚烷氧基烷基,环烷基苯基或苄基(全为os); R 3 -R 5 =烷基,烷氧基,烷硫基,单矿石二烷基氨基,烷硫基,烯基硫基或环烷硫基(所有的os为卤素);或苯基,苄基,苯氧基或苯硫基(全为os); R6,R7 = H;烷基,环烷基,烯基,烷氧基或烷氧基烷基(所有的os都为卤素);或苯基或苄基(均为os);或和或NR6R7 = os环(可选地由O或S中断)。

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