首页> 外国专利> Process for electrolytically metallizing the walls of holes in e.g. circuit boards, conductor foils and strips comprises inserting the material into a working container, contacting with an electrolyte, and further processing

Process for electrolytically metallizing the walls of holes in e.g. circuit boards, conductor foils and strips comprises inserting the material into a working container, contacting with an electrolyte, and further processing

机译:在孔中电解金属化孔壁的方法电路板,导体箔和带包括将材料插入工作容器中,与电解质接触并进行进一步处理

摘要

Process for electrolytically metallizing walls of holes in circuit boards, conductor foils and strips involves inserting the material into working container, contacting with electrolyte, forming electrolytic cell, galvanizing first side of material including all holes, changing anode/cathode distance in cell, changing poles of current source and electrochemically etching first side of material. Process for electrolytically metallizing the walls of holes in circuit boards, conductor foils and strips and for metallizing structures on the surface of materials in immersion bath devices, continuously operating devices and strip devices comprises: inserting the material into a working container; contacting the material with an electrolyte; conveying the electrolyte through the container and an electrolyte conditioning device; forming an electrolytic cell from an electrode and the material; connecting a current source electrically connected to a pole of the electrode and a pole of the first side of the material; galvanizing the first side of the material including all holes; changing the anode/cathode distance in the cell; changing the poles of the current source; electrochemically etching the first side of the material; and repeating the steps from the formation of the electrolytic cell. An Independent claim is also included for a device for carrying out the process. Preferred Features: During treatment of the second side of the material and through-contacting the holes, a second electrode is arranged opposite the second side of the material with a second current source. Soluble or inert anodes are used in the process.
机译:对电路板,导体箔和条带中的孔的壁进行电解金属化的方法包括将材料插入工作容器,与电解质接触,形成电解池,对包括所有孔的材料的第一面进行镀锌,改变池中阳极/阴极距离,改变极数电流源和电化学蚀刻材料的第一面。用于对电路板,导体箔和带中的孔的壁进行电解金属化以及对浸浴设备,连续操作的设备和带状设备中的材料表面上的结构进行金属化的方法,包括:将材料插入工作容器中;使材料与电解质接触;通过容器和电解质调节装置输送电解质;由电极和材料形成电解池;连接电连接到电极的极和材料的第一侧的极的电流源;镀锌材料的第一面,包括所有孔;更改电池中阳极/阴极的距离;改变电流源的极点;电化学蚀刻材料的第一面;并重复从形成电解槽开始的步骤。还包括用于执行该过程的设备的独立权利要求。优选特征:在材料的第二面的处理和通孔的接触期间,第二电极与材料的第二面相对地布置有第二电流源。在该过程中使用可溶性或惰性阳极。

著录项

  • 公开/公告号DE10209365C1

    专利类型

  • 公开/公告日2003-02-20

    原文格式PDF

  • 申请/专利权人 HUEBEL EGON;

    申请/专利号DE2002109365

  • 发明设计人 HUEBEL EGON;

    申请日2002-02-24

  • 分类号C25D7/00;H05K3/42;C25D7/06;C25D21/12;

  • 国家 DE

  • 入库时间 2022-08-21 23:42:10

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