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SOLUTION JETTING APPARATUS AND METHOD FOR JETTING SOLUTION

机译:解决方案点胶设备和解决方法点胶

摘要

PROBLEM TO BE SOLVED: To jet a solution to efficiently deposit it onto only an aimed position with high accuracy.;SOLUTION: A transparent substrate 2 having a plurality of surrounded regions surrounded by barrier walls arranged on one surface of the substrate is mounted on a worktable 1. The transparent substrate 2 and the atmosphere above are heated by a heater 68, while a nozzle 65 is cooled by supplying a cooling medium to a cooling medium jacket 69A from a cooling medium supplier 70A, all controlled by a controller 73A. The nozzle 65 and the transparent substrate 2 are relatively moved, the solution in a tank 66 is supplied to the nozzle 65, drops of the solution are continuously jetted from a jetting port 65a, and while the drops are heated, they reach at the surrounded regions of the heated transparent substrate 2.;COPYRIGHT: (C)2004,JPO&NCIPI
机译:解决的问题:喷射溶液以将其有效地高精度地有效地沉积到仅目标位置上;解决方案:将透明基板2安装在基板上,该透明基板2具有被布置在基板的一个表面上的阻挡壁围绕的多个包围区域。工作台1。透明基板2和上方的气氛由加热器68加热,同时喷嘴65通过从冷却介质供应器70A向冷却介质套69A供应冷却介质而被冷却,所有这些都由控制器73A控制。喷嘴65和透明基板2相对移动,将罐66中的溶液供应到喷嘴65,从喷射口65a连续喷射液滴,并且在加热液滴的同时,液滴到达周围。加热后的透明基板2的区域;版权所有:(C)2004,JPO&NCIPI

著录项

  • 公开/公告号JP2004230211A

    专利类型

  • 公开/公告日2004-08-19

    原文格式PDF

  • 申请/专利权人 CASIO COMPUT CO LTD;

    申请/专利号JP20030018578

  • 发明设计人 SHIMODA SATORU;

    申请日2003-01-28

  • 分类号B05C9/10;B05C5/00;B05D1/26;B05D3/02;B41J2/01;H05B33/10;H05B33/14;

  • 国家 JP

  • 入库时间 2022-08-21 23:35:19

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