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COATING SOLUTION FOR FORMING TRANSPARENT SILICA FILM AND METHOD FOR PRODUCING TRANSPARENT SILICA FILM

机译:形成透明二氧化硅膜的涂料溶液和制备透明二氧化硅膜的方法

摘要

PROBLEM TO BE SOLVED: To provide a coating solution for forming a transparent silica film stable even as the solution and readily forming a relatively thick silica film by coating once without using an organic solvent and to provide a method for producing the transparent silica film.;SOLUTION: The aqueous coating solution comprises at least one kind of silicon compound selected from the group consisting of silicon oxide, silicic acid and silicic acid hydrate having silanol groups, an organic strong base and a water-soluble polymer. The coating solution for forming the transparent silica film is characterized as dissolving the silicon compound in a water-soluble coating solution in the presence of the organic strong base.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:提供一种涂布液,该涂布液用于形成均匀稳定的透明二氧化硅膜,并且通过不使用有机溶剂一次涂布而容易地形成相对较厚的二氧化硅膜,并提供一种用于制备透明二氧化硅膜的方法。解决方案:水性涂料溶液包含至少一种选自具有硅醇基的氧化硅,硅酸和硅酸水合物的硅化合物,一种有机强碱和一种水溶性聚合物。用于形成透明二氧化硅膜的涂料溶液的特征在于,在有机强碱存在下将硅化合物溶解在水溶性涂料溶液中。; COPYRIGHT:(C)2004,JPO

著录项

  • 公开/公告号JP2004143186A

    专利类型

  • 公开/公告日2004-05-20

    原文格式PDF

  • 申请/专利权人 TOYO GOSEI KOGYO KK;

    申请/专利号JP20020266554

  • 发明设计人 UCHIDA TAKASHI;ARAUME KAZUMA;

    申请日2002-09-12

  • 分类号C09D1/00;B05D7/24;C01B33/12;C09D183/02;C09D201/00;H01L21/312;

  • 国家 JP

  • 入库时间 2022-08-21 23:34:36

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