FLUORINE-CONTAINING CYCLIC COMPOUND, FLUORINE-CONTAINING POLYMERIZABLE MONOMER, FLUORINE-CONTAINING POLYMER COMPOUND, RESIST MATERIAL PRODUCED BY USING THE SAME AND PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a new fluorine-containing cyclic compound, a fluorine-containing polymerizable monomer, a fluorine-containing polymer compound, a resist material having high transparency over a wide wavelength range from ultraviolet region to near infrared region and good film-forming property and adhesiveness to a substrate and a pattern forming method using the resist material.;SOLUTION: The fluorine-containing cyclic compound expressed by general formula (1) has one or more hexafluorocarbinol groups on norbornadiene which may have substituents. In the formula, R1, R2 and R3 are each H, an alkyl, fluorine, a fluoroalkyl or hexafluorocarbinol group; the hexafluorocarbinol groups in the formula may be partly or totally protected with a protecting group containing a 1-25C straight chain, branched or cyclic hydrocarbon group or aromatic hydrocarbon group which may further contain a fluorine atom, oxygen atom, nitrogen atom and carbonyl bond.;COPYRIGHT: (C)2005,JPO&NCIPI