首页> 外国专利> RUBBING APPARATUS AND RUBBING ROLLER USED FOR THE SAME, MANUFACTURING METHOD USING THE RUBBING APPARATUS, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DEVICE

RUBBING APPARATUS AND RUBBING ROLLER USED FOR THE SAME, MANUFACTURING METHOD USING THE RUBBING APPARATUS, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DEVICE

机译:用于相同用途的打磨设备和打磨辊,使用该打磨设备的制造方法以及制造液晶装置的方法

摘要

PROBLEM TO BE SOLVED: To provide a rubbing apparatus which can subject a surface of an alignment film formed on a substrate surface to rubbing treatment without transfer of a fatty acid amid component thereto during rubbing treatment and a rubbing roller used for the same.;SOLUTION: The rubbing apparatus for the substrate in an electro-optic device brings the rubbing roller whose peripheral surface is formed with rubbing cloth coated with a lubricant containing the fatty acid amid component and coated with a reinforcing material such, a resin, on its rear surface into contact with the alignment film formed on the substrate and subjects the alignment film to the rubbing treatment. The apparatus comprises performing the rubbing treatment by using the rubbing roller constituted by using the rubbing cloth containing the fatty acid amid component at ≤5% or preferably not containing the same.;COPYRIGHT: (C)2004,JPO&NCIPI
机译:解决的问题:提供一种摩擦装置和一种用于该摩擦装置的摩擦装置,该摩擦装置可以对在基板表面上形成的取向膜的表面进行摩擦处理,而在该摩擦处理期间不将脂肪酸酰胺成分转移到该摩擦装置上。 :用于电光装置中的基板的摩擦装置将其外周表面由摩擦布形成的摩擦辊在其背面上涂覆有含脂肪酸酰胺成分的润滑剂并涂覆有诸如树脂的增强材料的摩擦布。使其与形成在基板上的取向膜接触,并对取向膜进行摩擦处理。该设备包括通过使用摩擦辊进行摩擦处理,该摩擦辊是通过使用含有≤5%或优选不包含脂肪酸酰胺成分的摩擦布构成的。版权所有:(C)2004,JPO&NCIPI

著录项

  • 公开/公告号JP2004212783A

    专利类型

  • 公开/公告日2004-07-29

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20030001165

  • 发明设计人 MATSUHASHI KOICHI;KITAHARA HIDEKI;

    申请日2003-01-07

  • 分类号G02F1/1337;

  • 国家 JP

  • 入库时间 2022-08-21 23:31:07

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