首页> 外国专利> The method of etching the layer which is made to accumulate on the transparent backing material of glass backing material type

The method of etching the layer which is made to accumulate on the transparent backing material of glass backing material type

机译:蚀刻堆积在玻璃底材类型的透明底材上的层的方法

摘要

After the etching it had the mask which can remove, the transparent backing material of glass type (10) on, the layer which possesses, the electric conductivity of the metallic oxide type which is doped (11) being method in order electrochemistry to etch, as for the said method,One which - layer should etch territory (13) the conductive solution (20) with make contact at least,The - said solution (20) the electrode (30) thing, and the territory where it makes soak (13) making meet in, at the same time the territory (13) from the distance which is (d) with the electrode (30) arrange,The - electrode (30) with the layer which it should etch (11) voltage (U) apply between,It is, in order the electrode, etching to be executed in several territories of layer in regard to the width l of the backing material, it features that it possesses long form.
机译:蚀刻后,具有可除去掩模的玻璃型透明支撑材料(10),具有掺杂(11)的金属氧化物型导电性的层是为了电化学蚀刻的方法,上述方法,-至少蚀刻一层接触导电性溶液(20)的区域(13),-上述溶液(20)电极(30)的东西,并浸入的区域( 13)与电极(30)布置在距离(d)的距离(13)的同时,将-电极(30)与应蚀刻(11)电压的层(U)相接)适用于衬里材料的宽度l,以使电极在层的几个区域中进行蚀刻,它具有长形。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号