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AC SURFACE PHOTOVOLTAIC MEASURING APPARATUS AND NON-DESTRUCTIVE IMPURITY CONCENTRATION MEASURING METHOD OF SEMICONDUCTOR SURFACE USING IT

机译:交流表面光电测量装置及使用它的半导体表面无损杂质浓度测量方法

摘要

PROBLEM TO BE SOLVED: To provide a reliable AC surface photovoltaic measuring apparatus at low cost and a non-destructive impurity concentration measuring method of a semiconductor surface by using the photovoltaic measuring apparatus for measuring a frequency (f) dependency of SPV focusing on generation of acSPV and only on a part of the measuring apparatus.;SOLUTION: The AC surface photovoltaic measuring apparatus includes a test piece table 4, an Si wafer 5 set on the test piece table 4, an electrode fixing plate 6 having a transparent electrode 8 applied with an AC SPV signal and provided with a prescribed space above the Si wafer 5, an irradiating means for casting interrupting light (light beam) 10 onto the Si wafer 5, and a scanning mechanism having a X- and Y-axis driving motor for the irradiating means.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:通过使用用于测量SPV的频率(f)依赖性的光伏测量设备,提供一种低成本,可靠的AC表面光伏测量设备以及半导体表面的非破坏性杂质浓度测量方法,该方法关注于SPV的产生。解决方案:AC表面光伏测量设备包括一个试件台4,一个置于试件台4上的Si晶片5,一个涂有透明电极8的电极固定板6具有AC SPV信号并在Si晶片5上方设置有规定空间的装置,用于将遮断光(光束)10投射到Si晶片5上的照射装置,以及具有用于X轴和Y轴驱动的电动机的扫描机构。版权所有;(C)2004,日本特许厅

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