首页>
外国专利>
AC SURFACE PHOTOVOLTAIC MEASURING APPARATUS AND NON-DESTRUCTIVE IMPURITY CONCENTRATION MEASURING METHOD OF SEMICONDUCTOR SURFACE USING IT
AC SURFACE PHOTOVOLTAIC MEASURING APPARATUS AND NON-DESTRUCTIVE IMPURITY CONCENTRATION MEASURING METHOD OF SEMICONDUCTOR SURFACE USING IT
展开▼
机译:交流表面光电测量装置及使用它的半导体表面无损杂质浓度测量方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
PROBLEM TO BE SOLVED: To provide a reliable AC surface photovoltaic measuring apparatus at low cost and a non-destructive impurity concentration measuring method of a semiconductor surface by using the photovoltaic measuring apparatus for measuring a frequency (f) dependency of SPV focusing on generation of acSPV and only on a part of the measuring apparatus.;SOLUTION: The AC surface photovoltaic measuring apparatus includes a test piece table 4, an Si wafer 5 set on the test piece table 4, an electrode fixing plate 6 having a transparent electrode 8 applied with an AC SPV signal and provided with a prescribed space above the Si wafer 5, an irradiating means for casting interrupting light (light beam) 10 onto the Si wafer 5, and a scanning mechanism having a X- and Y-axis driving motor for the irradiating means.;COPYRIGHT: (C)2004,JPO
展开▼