METHOD FOR ADJUSTING OPTICAL PATH LENGTH OF OPTICAL WAVEGUIDE AND OPTICAL WAVEGUIDE CIRCUIT COMPONENT WHOSE OPTICAL PATH LENGTH IS ADJUSTED

摘要

PROBLEM TO BE SOLVED: To provide an optical path length adjusting technology for shortening the optical path length adjusting time after manufacturing a device and improving the productivity of the device.;SOLUTION: In the case of patterning an optical waveguide 201 on a substrate by using a photolithographic technique in the method for adjusting the optical path length of an optical waveguide, a photomask core circuit pattern to be used for photolithography is trimmed on the basis of the characteristics of an optical waveguide manufactured in the past and a part 203 from which a core disappears is formed on the optical waveguide 201 by using the trimmed photomask to adjust the optical path length.;COPYRIGHT: (C)2004,JPO