首页> 外国专利> MICROSCOPE, MICRO-PLASMA ARRAY FOR MICROSCOPE, METHOD OF OBSERVING SURFACE, AND METHOD OF REFORMING SURFACE

MICROSCOPE, MICRO-PLASMA ARRAY FOR MICROSCOPE, METHOD OF OBSERVING SURFACE, AND METHOD OF REFORMING SURFACE

机译:显微镜,用于显微镜的微等离子体阵列,观察表面的方法和重整表面的方法

摘要

PROBLEM TO BE SOLVED: To provide devices and methods by which surface observation, surface reformation, etc., can be performed easily in a short time in a micrometer area or larger.;SOLUTION: A microscope comprises a micro-plasma array 10 constituted by erecting a plurality of probes 13 on a substrate 11, a gas introducing means which introduces a plasma generating gas to the vicinity of the micro-plasma array 10, and a high frequency impressing means which generates a plasma jet by ionizing the plasma generating gas by impressing a high frequency upon the array 10. The microscope also comprises an induced-current measuring means which measures a plasma-induced current generated between the micro-plasma array 10 and a sample X to be observed.;COPYRIGHT: (C)2004,JPO&NCIPI
机译:解决的问题:提供一种装置和方法,通过该装置和方法,可以在短时间内在微米级或更大的面积上轻松地进行表面观察,表面重整等。解决方案:显微镜包括由以下组成的微等离子体阵列10在基板11上竖立多个探针13,将等离子体产生气体引入微等离子体阵列10附近的气体引入装置,以及通过使等离子体产生气体电离而产生等离子体射流的高频施加装置。显微镜还包括感应电流测量装置,该感应电流测量装置测量在微等离子体阵列10和要观察的样品X之间产生的等离子体感应电流。版权:(C)2004,日本特许厅

著录项

  • 公开/公告号JP2004219148A

    专利类型

  • 公开/公告日2004-08-05

    原文格式PDF

  • 申请/专利权人 UNIV SAITAMA;

    申请/专利号JP20030004364

  • 发明设计人 HASEGAWA YASUHIRO;SHIRAI HAJIME;

    申请日2003-01-10

  • 分类号G01B7/28;H01L21/66;H05H1/00;H05H1/24;

  • 国家 JP

  • 入库时间 2022-08-21 23:29:00

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