MANUFACTURING METHOD OF SUBSTRATE OF DIRECT MASTERING, SUBSTRATE OF DIRECT MASTERING, AND MANUFACTURING METHOD OF STAMPER

摘要

PROBLEM TO BE SOLVED: To provide a substrate of direct mastering which is reduced in surface roughness so as to be the same as that of the original master disk and is excellent in durability, its manufacturing method and a manufacturing method of a stamper using such a substrate of the direct mastering.;SOLUTION: An etching layer 18 of an DLC (diamond-like carbon) or TiNc on an original master disk 20 of a ground glass or a silicon compound such as Si, SiC or SiO₂ is formed, an electroforming film 14 is coated by electroforming after forming a conductive layer 13 by spattering thereon, and the substrate is manufactured by exfoliating the etching layer 18 from the master disk 20. A photoresist 17 is coated on the substrate, the photoresist 17 is exposed by a laser beam 15 of an electron beam 21 to record a signal, a pattern is formed by developing the photoresist 17 so as to be dry-etched using the pattern as a mask, and the stamper is manufactured by removing the photoresist 17 by ashing.;COPYRIGHT: (C)2004,JPO