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COMPOSITION FOR NEGATIVE ELECTRODEPOSITION PHOTORESIST, ELECTRODEPOSITION LIQUID COMPRISING BY USING THE SAME AND ELECTRODEPOSITION COATING FILM FORMED FROM THE LIQUID
COMPOSITION FOR NEGATIVE ELECTRODEPOSITION PHOTORESIST, ELECTRODEPOSITION LIQUID COMPRISING BY USING THE SAME AND ELECTRODEPOSITION COATING FILM FORMED FROM THE LIQUID
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机译:负电光致抗蚀剂的组合物,通过使用相同的和电沉积的镀膜组成的电沉积液体
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摘要
PROBLEM TO BE SOLVED: To provide an electrodeposition coating film which is uniform on a fine substrate and does not exposure the edge part of the objective material and to provide an electrodeposition liquid for a negative resist and an electrodeposition liquid composition to form the coating film.;SOLUTION: The electrodeposition coating film is formed by using the following negative electrodeposition photoresist liquid. The electrodeposition liquid is prepared by using (a) cationic water-soluble or water-dispersible (meth)acrylic resin, (b) polyfunctional (meth)acrylic monomer, (c) photopolymerization initiator, (d) neutralizing agent for the component (a), (e) organic solvent and (f) deionized water and by controlling the maximum difference in the hysteresis loop of shear stress of the composition consisting of the components (a), (b) and (c) to more than 3 mN/cm2 and less than 10 mN/cm2.;COPYRIGHT: (C)2004,JPO
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机译:解决的问题:提供一种在精细基板上均匀且不暴露目标材料的边缘部分的电沉积涂膜,并提供用于负性抗蚀剂的电沉积液和电沉积液组合物以形成涂膜。 ;解决方案:电沉积涂膜是通过使用以下负电光刻胶液形成的。通过使用(a)阳离子水溶性或水分散性(甲基)丙烯酸树脂,(b)多官能(甲基)丙烯酸单体,(c)光聚合引发剂,(d)中和剂作为组分(a)制备电沉积液),(e)有机溶剂和(f)去离子水并通过将由组分(a),(b)和(c)组成的组合物的剪切应力的磁滞回线的最大差值控制在3 mN / cm 2 Sup>并且小于10 mN / cm 2 Sup>。
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