METHOD OF FORMING OPTICAL THIN FILM FOR DISPLAY WINDOW MATERIAL AND OPTICAL THIN FILM STRUCTURE

摘要

PROBLEM TO BE SOLVED: To provide a method of forming an optical thin film for a display window material by which the sticking strength of a porous silica material to a transparent conductive film is improved in forming the optical thin film by lamination while having a low refractive index film consisting of the porous silica material and the transparent conductive film in order to highly efficiently take out luminescence and an optical thin film structure formed using the method.;SOLUTION: The optical thin film structure is formed by laminating the transparent conductive film 2 and the low refractive index film 3 consisting of the hydrophobic porous silica material through an intermediate adhesive layer 4 composed of a transparent insulation layer such as a SiO₂ film on a glass substrate 1. In such a case, it is desirable that the low refractive index film 3 consisting of the hydrophobic porous silica material has 0.3-2.0 μm film thickness and ≤50 nm flatness expressed by the center line average roughness and the intermediate adhesive layer 4 composed of the transparent insulation film has 5-300 nm film thickness and ≤50 nm flatness expressed by the center line average roughness.;COPYRIGHT: (C)2004,JPO