首页> 外国专利> MICRO-ETCHING AGENT FOR COPPER AND COPPER ALLOY AND METHOD FOR MICRO-ROUGHENING COPPER OR COPPER ALLOY BY USING THE AGENT

MICRO-ETCHING AGENT FOR COPPER AND COPPER ALLOY AND METHOD FOR MICRO-ROUGHENING COPPER OR COPPER ALLOY BY USING THE AGENT

机译:用于铜和铜合金的微蚀刻剂以及使用该试剂的微粗化铜或铜合金的方法

摘要

PPROBLEM TO BE SOLVED: To provide a micro-etching agent for a copper and copper alloy, which can roughen the surfaces of copper and the copper alloy, and to provide a method for micro-roughening the copper or the copper alloy by using the etching agent. PSOLUTION: The micro-etching agent for the copper and the copper alloy contains a compound (A) selected from the group consisting of sulfuric acid, alkane sulfonic acid, alkanol sulfonic acid and a derivative thereof, peroxide (B), a compound (C) selected from the group consisting of tetrazole and a derivative thereof, and ions (D) of metal with nobler potential than copper (excepting ions of silver when the component (A) is sulfuric acid). The method for micro-roughening copper or the copper alloy uses the etching agent. Since the surfaces of the copper alloy and the copper alloy are efficiently roughened, not only adhesion with a resin layer can sufficiently be obtained even if etching is not deeply performed, but also, sufficient roughening is made possible even to a rolled article of the copper alloy such as a lead frame to which roughening has been difficult heretofore with the micro-etching agent for the copper and the copper alloy. PCOPYRIGHT: (C)2004,JPO
机译:

要解决的问题:提供一种用于铜和铜合金的微蚀刻剂,该蚀刻剂可以使铜和铜合金的表面变粗糙,并提供一种通过以下方法对铜或铜合金进行微粗糙化的方法:使用蚀刻剂。

解决方案:用于铜和铜合金的微蚀刻剂包含选自硫酸,烷烃磺酸,链烷醇磺酸及其衍生物的化合物(A),过氧化物(B),选自四唑及其衍生物的化合物(C),以及比铜具有更高电势的金属离子(D)(当组分(A)为硫酸时,银离子除外)。用于使铜或铜合金微粗糙化的方法使用蚀刻剂。由于铜合金和铜合金的表面被有效地粗糙化,因此即使不进行深腐蚀也不仅能够充分获得与树脂层的密合性,而且即使对铜的压延品也能够充分地粗糙化。迄今为止,用铜和铜合金的微蚀刻剂很难使合金如引线框架变粗糙。

版权:(C)2004,日本特许厅

著录项

  • 公开/公告号JP2004003020A

    专利类型

  • 公开/公告日2004-01-08

    原文格式PDF

  • 申请/专利权人 EBARA UDYLITE KK;

    申请/专利号JP20030133951

  • 发明设计人 KOBAYASHI NOBUO;

    申请日2003-05-13

  • 分类号C23F1/18;

  • 国家 JP

  • 入库时间 2022-08-21 23:24:30

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