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Harmful matter removal device in exhaust gas, the manner and active carbon null for harmful matter removal

机译:废气中有害物质去除装置,去除有害物质的方式和活性炭

摘要

PROBLEM TO BE SOLVED: To provide a harmful material removing device and a harmful material removing method capable of increasing the removing efficiency of the harmful material such as dioxins. ;SOLUTION: In the waste gas treating device provided with the adsorption column for adsorbing the harmful material such as dioxins in waste combustion waste gas and the desalting device for removing the acidic gas. such as gaseous hydrogen chloride in the waste gas, the adsorption column is disposed at the upstream side of the desalting device, and the device is operated so that the inside of the adsorption column may be a gaseous hydrogen chloride atmosphere. The inside of the column is kept in gaseous hydrogen chloride or gaseous chlorine atmosphere by injecting the gaseous hydrogen chloride or the gaseous chlorine into the adsorption column for adsorbing the harmful material such as dioxins in the waste combustion waste gas. The temp. at the inside of the adsorption column is kept at 100-200°C and the concn. of the gaseous hydrogen chloride or the gaseous chlorine is kept at 1-100 ppm (dry) preferably.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:提供一种能够提高二恶英等有害物质的去除效率的有害物质去除装置和有害物质去除方法。 ;解决方案:在废气处理装置中,设有用于吸附燃烧废气中二恶英等有害物质的吸附塔和用于去除酸性气体的脱盐装置。在废气脱盐装置的上游侧配置有吸附塔等废气中的气态氯化氢等吸附塔,使吸附塔的内部成为气态氯化氢气氛。通过将气态氯化氢或气态氯注入到吸附塔中以在废气燃烧废气中吸附二恶英等有害物质,将塔内部保持在气态氯化氢或气态氯气氛中。温度吸附塔内部的温度保持在100-200℃。气态氯化氢或气态氯的含量最好保持在1-100 ppm(干燥).;版权所有:(C)2000,JPO

著录项

  • 公开/公告号JP3486767B2

    专利类型

  • 公开/公告日2004-01-13

    原文格式PDF

  • 申请/专利权人 日立造船株式会社;

    申请/专利号JP19980371839

  • 发明设计人 篠原 力男;古林 通孝;長屋 喜一;

    申请日1998-12-28

  • 分类号B01D53/70;B01D53/02;B01D53/34;B01J20/20;

  • 国家 JP

  • 入库时间 2022-08-21 23:24:25

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