首页> 外国专利> Bi-state rate dip hydraulic mount

Bi-state rate dip hydraulic mount

机译:双向倾角液压支架

摘要

A hydraulic mount provides active control of dip rate performance through use of an orifice track connecting a primary pumping chamber of the mount to a secondary fluid chamber having a movable wall, and an actuator for regulating pressure applied to the movable wall for controlling movement of the movable wall. With little or no pressure applied to the movable wall, the mount provides significant isolation and very little damping in a predetermined and designed frequency range. As pressure is applied to the movable wall, the stiffness of the mount is increased significantly, to thereby provide substantial damping.
机译:液压支架通过使用孔口轨道来主动控制浸入速率性能,该孔口轨道将支架的主要泵送腔室与具有活动壁的次要流体腔室相连接,并提供执行器来调节施加到活动壁上的压力,以控制活动壁活动墙。在几乎没有压力或没有压力施加到可移动壁的情况下,安装座在预定的和设计的频率范围内提供了显着的隔离和非常小的阻尼。当压力施加到可移动壁上时,支架的刚度显着增加,从而提供了很大的阻尼。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号