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Short-wavelength photodiode of enhanced sensitivity with low leak current and method of manufacturing photodiode

机译:低漏电流,灵敏度提高的短波长光电二极管及其制造方法

摘要

A photodiode comprises an optical detection portion for detecting an optical signal and outputting a photoelectric conversion signal. The optical detection portion has a semiconductor substrate of a first conductive type and semiconductor layers of a second conductive type formed in spaced-apart relation in a surface of the semiconductor subtrate. A depletion layer is formed in the semiconductor subtrate by application of a reverse bias to the photodiode so as to surround the semiconductor layers. An etched surface portion of the depletion layer is disposed between the semiconductor layers so that an interface level region of the surface of the semiconductor substrate does not exist between the semiconductor layers.
机译:光电二极管包括用于检测光信号并输出​​光电转换信号的光学检测部分。光学检测部分具有第一导电类型的半导体基板和第二导电类型的半导体层,所述第一导电类型的半导体基板和第二导电类型的半导体层以间隔开的关系形成在半导体基板的表面中。通过向光电二极管施加反向偏压以在半导体衬底中形成耗尽层,从而围绕半导体层。耗尽层的蚀刻表面部分设置在半导体层之间,从而在半导体层之间不存在半导体衬底的表面的界面能级区域。

著录项

  • 公开/公告号US6809391B1

    专利类型

  • 公开/公告日2004-10-26

    原文格式PDF

  • 申请/专利权人 SEIKO INSTR INC;

    申请/专利号US20000638194

  • 发明设计人 SUMIO KOIWA;

    申请日2000-08-11

  • 分类号H01L310/60;

  • 国家 US

  • 入库时间 2022-08-21 23:19:05

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