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System and method for utilization of waste heat of semiconductor equipment and heat exchanger used for utilization of waste heat of semiconductor equipment

机译:利用半导体设备废热的系统和方法以及用于利用半导体设备废热的热交换器

摘要

An amount of energy consumption in a semiconductor fabrication facility can be reduced by using cooling water drained from a semiconductor fabrication apparatus as a heat source of another semiconductor fabrication apparatus. Cooling water of 80 C. drained from a heating furnace of a heat processing apparatus (10) is supplied to a deionized water heating apparatus (32) of a cleaning apparatus (30). The deionized water heating apparatus (32) raises a temperature of deionized water of a room temperature to 60 C. through heat exchange with the cooling water of 80 C. The cooling water, whose temperature falls to 30 C. after the heat exchange, is reutilized for cooling of the heating furnace (12).
机译:通过使用从半导体制造设备排出的冷却水作为另一半导体制造设备的热源,可以减少半导体制造设备中的能量消耗量。从热处理设备的加热炉中排出的 80 的冷却水( 10 )供给去离子水加热设备( 32 )( 30 )。去离子水加热装置( 32 )通过与 80 的冷却水进行热交换,将室温的去离子水的温度提高到 60 。 B>C。热交换后温度降至 30 的冷却水被重新用于冷却加热炉( 12 )。

著录项

  • 公开/公告号US2004074451A1

    专利类型

  • 公开/公告日2004-04-22

    原文格式PDF

  • 申请/专利权人 SUENAGA OSAMU;KOBAYASHI SADAO;

    申请/专利号US20030468362

  • 发明设计人 OSAMU SUENAGA;SADAO KOBAYASHI;

    申请日2003-08-19

  • 分类号F22B37/00;

  • 国家 US

  • 入库时间 2022-08-21 23:18:47

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