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System and method for utilization of waste heat of semiconductor equipment and heat exchanger used for utilization of waste heat of semiconductor equipment
System and method for utilization of waste heat of semiconductor equipment and heat exchanger used for utilization of waste heat of semiconductor equipment
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机译:利用半导体设备废热的系统和方法以及用于利用半导体设备废热的热交换器
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摘要
An amount of energy consumption in a semiconductor fabrication facility can be reduced by using cooling water drained from a semiconductor fabrication apparatus as a heat source of another semiconductor fabrication apparatus. Cooling water of 80 C. drained from a heating furnace of a heat processing apparatus (10) is supplied to a deionized water heating apparatus (32) of a cleaning apparatus (30). The deionized water heating apparatus (32) raises a temperature of deionized water of a room temperature to 60 C. through heat exchange with the cooling water of 80 C. The cooling water, whose temperature falls to 30 C. after the heat exchange, is reutilized for cooling of the heating furnace (12).
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