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Plasma processing apparatus capable of performing uniform plasma treatment by preventing drift in plasma discharge current
Plasma processing apparatus capable of performing uniform plasma treatment by preventing drift in plasma discharge current
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机译:通过防止等离子体放电电流的漂移能够进行均匀的等离子体处理的等离子体处理装置
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摘要
A plasma processing apparatus has a plasma processing chamber that accommodates an electrode pair of a plasma excitation electrode for exciting plasma and a susceptor electrode facing the plasma excitation electrode, a workpiece to be treated being placed therebetween. The apparatus also has a chassis that accommodates an impedance matching circuit, provided in the middle of a supply path for feeding RF power from an RF generator to the plasma excitation electrode, for matching the impedance between the RF generator and the plasma processing chamber. In the chassis, impedances are axisymmetrically equal at a predetermined frequency with respect to the direction of a high-frequency current returning to the RF generator. The matching circuit has at least two inductance coils connected in parallel.
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