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Non-volatile memory transistor array implementing amp;ldquo;Hamp;rdquo; shaped source/drain regions and method for fabricating same
Non-volatile memory transistor array implementing amp;ldquo;Hamp;rdquo; shaped source/drain regions and method for fabricating same
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机译:实现“ H”的非易失性存储晶体管阵列成形的源/漏区及其制造方法
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摘要
A non-volatile memory (NVM) array including a plurality of 2-bit NVM transistors arranged in a plurality of rows extending along a first axis, and a plurality of columns extending along a second axis, perpendicular to the first axis. The non-volatile memory array includes a plurality of field isolation regions located in a semiconductor substrate and a plurality of word lines extending over the semiconductor substrate along the first axis, wherein the word lines form control gates of the 2-bit NVM transistors. Oxide-nitride-oxide (ONO) structures are formed between the substrate and the word lines, wherein the nitride layer provides floating gate storage for the NVM transistors. A plurality of H-shaped source/drain regions are defined by the field isolation regions and the word lines, wherein each source/drain region serves as a source/drain for four different NVM transistors in the array.
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