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Imaging optical system for oblique incidence interferometer

机译:斜入射干涉仪的成像光学系统

摘要

An imaging optical system for an oblique incidence interferometer comprises first and second optical systems and an intermediate imaging surface therebetween. Each of the first and second imaging optical systems comprises two telecentric lenses, arranged afocal to each other, having respective focal lengths different from each other. A first image of a surface to be inspected having a deformed aspect ratio with respect to this surface is formed on the intermediate imaging surface by way of the first imaging optical system. The second imaging optical system is arranged such that the first image is focused onto the imaging surface of the interferometer as a second image corrected so as to have substantially the same aspect ratio as that of the surface to be inspected.
机译:用于斜入射干涉仪的成像光学系统包括第一光学系统和第二光学系统以及在它们之间的中间成像表面。第一成像光学系统和第二成像光学系统中的每一个均包括彼此焦距布置的两个远心透镜,其各自的焦距彼此不同。通过第一成像光学系统在中间成像表面上形成相对于该表面具有变形的长宽比的待检查表面的第一图像。布置第二成像光学系统,使得第一图像作为被校正的第二图像被聚焦到干涉仪的成像表面上,从而具有与被检查表面的纵横比基本相同的纵横比。

著录项

  • 公开/公告号US6744523B2

    专利类型

  • 公开/公告日2004-06-01

    原文格式PDF

  • 申请/专利权人 FUJI PHOTO OPTICAL CO. LTD.;

    申请/专利号US20020105371

  • 发明设计人 NOBUAKI UEKI;HIDEO KANDA;

    申请日2002-03-26

  • 分类号G01B90/20;

  • 国家 US

  • 入库时间 2022-08-21 23:15:38

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