首页> 外国专利> Free atom aqueous solution producing apparatus, free-atom aqueous solution producing method, and free-atom aqueous solution

Free atom aqueous solution producing apparatus, free-atom aqueous solution producing method, and free-atom aqueous solution

机译:游离原子水溶液制造装置,游离原子水溶液制造方法以及游离原子水溶液

摘要

A free radical solution producing apparatus, which comprises: a feed port (6) in which water is drawn, a dechlorination processing section (1) which produces first water by decomposing chlorine compounds in said water, a magnetic processing section (2) which produces second water by carrying out a process that applies a magnetic field to said first water, a radiation processing section (3) which produces third water by carrying out a process that irradiates a radiation to said second water, an ion exchange section (4) which produces fourth water by carrying out a process that performs an ion exchange for said third water, an electric field applying section (5) which produces fifth water by carrying out a process that applies a strong electric field to said fourth water, and a fifth water intake (7-5) from which said fifth water is obtained, produces water which has the effects of sterilizing and disinfection, and strong cleansing power.
机译:一种自由基溶液生产装置,包括:进水口( 6 ),其中抽水;脱氯处理段( 1 ),其通过分解氯气产生第一水所述水中的化合物,磁处理区( 2 )和辐射处理区( 3 ),磁处理区通过执行向所述第一水中施加磁场的过程而产生第二水。 >),通过执​​行向所述第二水照射辐射的过程来产生第三水,离子交换部分( 4 )通过执行对所述第二水进行离子交换的过程来产生第四水第三水,电场施加部( 5 )和第五进水口( 5 ),该电场施加部通过对所述第四水施加强电场而产生第五水。 B>- 5 ),从其中获得所述第五种水,产生的水具有杀菌,消毒和强力清洁的作用功率。

著录项

  • 公开/公告号US2004065625A1

    专利类型

  • 公开/公告日2004-04-08

    原文格式PDF

  • 申请/专利权人 FUKUI KENJI;KAMIYA HIROAKI;

    申请/专利号US20030470683

  • 发明设计人 KENJI FUKUI;HIROAKI KAMIYA;

    申请日2003-07-30

  • 分类号B03C1/00;

  • 国家 US

  • 入库时间 2022-08-21 23:15:04

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