首页> 外国专利> System and method for performing thin film deposition or chemical treatment using an energetic flux of neutral reactive molecular fragments, atoms or radicals

System and method for performing thin film deposition or chemical treatment using an energetic flux of neutral reactive molecular fragments, atoms or radicals

机译:使用中性反应性分子片段,原子或自由基的高能通量进行薄膜沉积或化学处理的系统和方法

摘要

A system and method for forming a chemically reacted layer proximate an exposed surface of a substrate is disclosed. A gas supply provides a chemically reactive molecular gas to an ion source that generates a divergent ion current directed at a target. The ion current contains at least one species of chemically reactive molecular ion, and the target is disposed in a chamber having a partial vacuum. A voltage source applies a bias to the target such that chemically reactive molecular ions from the ion source are accelerated toward the target with sufficient kinetic energy to dissociate at least some of the chemically reactive molecular ions by collision with the surface of the target.
机译:公开了一种用于在衬底的暴露表面附近形成化学反应层的系统和方法。气体源向离子源提供化学反应分子气体,该离子源产生指向目标的发散离子流。离子流包含至少一种化学反应性分子离子,并且将靶设置在具有部分真空的腔室中。电压源向靶施加偏压,使得来自离子源的化学反应性分子离子以足够的动能朝靶加速,以通过与靶表面的碰撞来解离至少一些化学反应性分子离子。

著录项

  • 公开/公告号US6723209B2

    专利类型

  • 公开/公告日2004-04-20

    原文格式PDF

  • 申请/专利权人 4-WAVE INC.;

    申请/专利号US20020200578

  • 发明设计人 DAVID ALAN BALDWIN;TODD LANIER HYLTON;

    申请日2002-07-22

  • 分类号C23C143/40;

  • 国家 US

  • 入库时间 2022-08-21 23:14:06

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号