首页>
外国专利>
Improved deposition shield in a plasma processing system,and methods of manufacture of such shield
Improved deposition shield in a plasma processing system,and methods of manufacture of such shield
展开▼
机译:等离子体处理系统中改进的沉积屏蔽层以及这种屏蔽层的制造方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
The present invention presents an improved deposition shield for surrounding a process space in a plasma processing system, wherein the design and fabrication of the deposition shield advantageously provides for a clean processing plasma in the process space with substantially minimal erosion of the deposition shield.
展开▼