METHOD FOR MONITORING ANNEALING PROCESS BY MEASURING THERMAL WAVE VALUE OF PRE-ANNEALING PROCESS AND THERMAL WAVE VALUE OF POST-ANNEALING PROCESS

摘要

Purpose: a kind of method is arranged to monitor an annealing process for monitoring an annealing process, by measuring a heat wave value of a heat wave value of a pre-annealing process and the annealing process of a postwelding and heat wave value being applied to reference data. Construction: a heat wave value of a pre-annealing process is by measuring from semi-conductive substrate (110). One annealing process is performed on semiconductor substrate (120). One heat wave value of the annealing process of one postwelding is by measuring from semiconductor substrate (130). The heat wave value of the annealing process of the heat wave value and postwelding of pre-annealing process is compared with reference data (140).