首页> 外国专利> PROCESS CHAMBER FOR FABRICATING SEMICONDUCTOR TO SECURELY SEAL VIEW PORT PORTION AFTER CLEANING PROCESS WHILE EASILY CLEANING VIEW PORT PORTION IN CHAMBER CLEANING PROCESS

PROCESS CHAMBER FOR FABRICATING SEMICONDUCTOR TO SECURELY SEAL VIEW PORT PORTION AFTER CLEANING PROCESS WHILE EASILY CLEANING VIEW PORT PORTION IN CHAMBER CLEANING PROCESS

机译:腔室,用于在清洁过程之后方便地制造半导体以确保密封视图端口部分的安全,同时在腔室清洁过程中方便地查看视图端口部分的过程

摘要

PURPOSE: A process chamber for fabricating a semiconductor is provided to securely seal a view port portion after a cleaning process while easily cleaning the view port portion in a chamber cleaning process by installing a view port hole and a view port window in a process chamber to monitor the inside of the process chamber from the outside. CONSTITUTION: A predetermined process is performed in a chamber body(161). A wafer is placed on a wafer chuck(163) installed in the chamber body. A view port portion is formed in the chamber to monitor the process state of the chamber from the outside of the chamber. A view port hole(166) passes through the inside and outside of the chamber. The view port hole is covered with a view port window to seal the inside of the chamber. The view port window is made of a transparent material to monitor the inside of the chamber from the outside of the chamber. A window position holding unit rotates the view port window by a predetermined angle to selectively make the view port window open/shut the view port hole, and forcibly stops the view port window when the view port window is rotated by a predetermined angle to be located in the position where the view port hole is covered. A coupling member couples the view port window to the chamber when the view port hole is covered with the view port window.
机译:目的:提供一种用于制造半导体的处理腔室,以在清洁处理之后牢固地密封视口部分,同时通过在处理腔室中安装视口孔和视口窗口以在腔室清洁过程中轻松清洁视口部分。从外部监控处理室的内部。组成:一个预定的过程是在一个腔体(161)。将晶片放置在安装在腔室主体中的晶片卡盘(163)上。在腔室中形成有观察孔部分,以从腔室的外部监视腔室的处理状态。观察孔(166)穿过腔室的内部和外部。观察孔被观察孔窗口覆盖,以密封腔室内部。视口窗口由透明材料制成,以从腔室的外部监视腔室的内部。窗口位置保持单元将视口窗口旋转预定角度以选择性地使视口窗口打开/关闭视口孔,并且当视口窗口旋转预定角度以进行定位时强制停止视口窗口。在遮盖观察孔的位置。当视口孔被视口窗覆盖时,联接构件将视口窗耦接到腔室。

著录项

  • 公开/公告号KR20040082648A

    专利类型

  • 公开/公告日2004-09-30

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20030017251

  • 发明设计人 YOON SEOK WON;

    申请日2003-03-19

  • 分类号H01L21/00;

  • 国家 KR

  • 入库时间 2022-08-21 22:47:58

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