首页> 外国专利> SURFACE TREATMENT METHOD BY CONTROLLING VARIATIONS OF ACCUMULATED INTENSITY OF ILLUMINATION OF ENERGY LIGHT ON SUBSTRATE TO 20 OR LOWER, SURFACE TREATMENT APPARATUS, SURFACE TREATED SUBSTRATE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC DEVICE

SURFACE TREATMENT METHOD BY CONTROLLING VARIATIONS OF ACCUMULATED INTENSITY OF ILLUMINATION OF ENERGY LIGHT ON SUBSTRATE TO 20 OR LOWER, SURFACE TREATMENT APPARATUS, SURFACE TREATED SUBSTRATE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC DEVICE

机译:通过控制基质上能量光照射的累计强度变化至20%或更低的表面处理方法,表面处理设备,表面处理过的基质,光电器件和电子设备

摘要

PURPOSE: A surface treatment method, a surface treatment apparatus, a surface treated substrate, an electro-optical device, and an electronic device are provided to control a contact angle between a liquid member and a substrate even in case where the substrate is large. CONSTITUTION: A surface treatment method comprises a step of performing a hydrophobic process on a surface of a substrate(11); and a step of performing a hydrophilic process on the surface of the substrate by irradiating energy light on the surface passed through the step of hydrophobic process. Variations of accumulated intensity of illumination of the energy light on the surface of the substrate are controlled to 20% or lower.
机译:用途:提供表面处理方法,表面处理设备,表面处理过的基板,电光装置和电子装置,即使在基板较大的情况下,也可以控制液体构件与基板之间的接触角。组成:一种表面处理方法,包括在基材表面进行疏水处理的步骤(11);通过在通过疏水处理步骤的表面上照射能量光,在基板的表面上进行亲水处理的步骤。将能量光在基板表面上的累积照明强度的变化控制为20%或更低。

著录项

  • 公开/公告号KR20040084679A

    专利类型

  • 公开/公告日2004-10-06

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORPORATION;

    申请/专利号KR20040019207

  • 发明设计人 HASEI HIRONORI;HIRAI TOSHIMITSU;

    申请日2004-03-22

  • 分类号H01J9/20;

  • 国家 KR

  • 入库时间 2022-08-21 22:47:58

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