COMPOSITION FOR COATING FILM, METHOD FOR PREPARING THE SAME, TANTALUM OXIDE FILM AND METHOD FOR FORMING TANTALUM OXIDE FILM TO PROVIDE SUFFICIENT RELATIVE PERMITTIVITY AND SMALL LEAK CURRENT THROUGH EFFICIENT AND CONVENIENT PROCESS

摘要

PURPOSE: A composition for a coating film, a method for preparing the same, tantalum oxide film and a method for forming tantalum oxide film are provided to obtain sufficient relative permittivity and small leak current in the resulted tantalum oxide film in convenient and efficient way. The composition is possible to be stored for a long period at high humidity. CONSTITUTION: The composition for a coating film for forming a tantalum oxide film comprises: a compound resulted from the reaction between a tantalum alkoxide and at least one compound selected from carbamic acids, carboxylic acids and carboxyl anhydrides; and a solvent. The method for forming a tantalum oxide film comprises: forming a coating film of the above-mentioned composition on a substrate; and treating the coating film with heat and/or light.