首页> 外国专利> CHARACTERISTIC MEASURING SYSTEM FOR FIELD EMISSION DISPLAY DEVICE, INCLUDING WAVEFORM GENERATOR, RESISTOR, ELECTRON FOCUSING UNIT, WAVEFORM DETECTION UNIT AND COMPUTATION UNIT

CHARACTERISTIC MEASURING SYSTEM FOR FIELD EMISSION DISPLAY DEVICE, INCLUDING WAVEFORM GENERATOR, RESISTOR, ELECTRON FOCUSING UNIT, WAVEFORM DETECTION UNIT AND COMPUTATION UNIT

机译:场发射显示装置的特征测量系统,包括波形发生器,电阻器,电子聚焦装置,波形检测装置和计算装置

摘要

PURPOSE: A characteristic measuring system is provided to quickly measure electrical characteristics in each of pixels of field emission array, and estimate luminance characteristics by using data. CONSTITUTION: A characteristic measuring system comprises a waveform generator(20) for applying voltage of a predetermined waveform to a gate(4); a resistor(30) connected between an anode(1) and a grounding terminal; an electron focusing unit(80) for focusing electrons emitted to an anode(2); a waveform detection unit for detecting waveform of the voltage input to the gate from the waveform generator and output waveform between the cathode and the resistor; and a computation unit for analyzing the waveform detected by the waveform detection unit, and computing an equivalent resistance value and equivalent capacitance between the gate and the cathode by performing a predetermined computation in accordance with the result of the analysis.
机译:目的:提供一种特性测量系统,以快速测量场发射阵列的每个像素中的电特性,并通过使用数据来估计亮度特性。构成:一种特征测量系统,包括:波形发生器(20),用于将预定波形的电压施加到门(4);电阻(30)连接在阳极(1)和接地端子之间;电子聚焦单元(80),用于聚焦发射到阳极(2)的电子。波形检测单元,用于检测从波形发生器输入到栅极的电压的波形以及在阴极和电阻之间的输出波形;计算单元,用于分析由波形检测单元检测到的波形,并根据分析结果通过预定的计算来计算栅极和阴极之间的等效电阻值和等效电容。

著录项

  • 公开/公告号KR100434525B1

    专利类型

  • 公开/公告日2004-05-25

    原文格式PDF

  • 申请/专利权人 SAMSUNG SDI CO. LTD.;

    申请/专利号KR19980012858

  • 发明设计人 KIM JEONG U;

    申请日1998-04-10

  • 分类号H01J9/42;

  • 国家 KR

  • 入库时间 2022-08-21 22:47:03

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