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CONTROLLED-PARAMETER REPETITIVE-PULSE CHEMICAL LASER (ALTERNATIVES)
CONTROLLED-PARAMETER REPETITIVE-PULSE CHEMICAL LASER (ALTERNATIVES)
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机译:参量重复脉冲化学激光(替代品)
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摘要
FIELD: quantum electronics.;SUBSTANCE: laser has gas-discharge tube placed in cavity and connected to inductance coil, main and additional active-medium excitation pulse sources, and controllable delay line of active-medium excitation pulse source. Laser designed to first and second alternative has in addition storage capacitor with parallel-connected resistor and control pulse length shaper. Laser of third design alternate has in addition diode with parallel-connected resistor and control pulse length shaper.;EFFECT: enhanced operating reliability, reduced mass, size, and cost.;4 cl, 6 dwg
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