A photomask, comprising:a first established - test pattern with a plurality of line / distance - patterns, which comprises a first pair of line / distance - patterns, which have different lengths, and a second pair of line / distance - patterns, which have different lengths, whereas they have a line width, the different to that of the first line / distance - pattern pair, wherein the first and second line / distance - pattern repetitions are arranged laterally, anda plurality of contact openings, which consist of a pair of first and a second pair of contact openings, wherein the first and second contact opening pairs of laterally and are arranged in the longitudinal direction of repetitions, while in the longitudinal direction of the line / distance - patterns by means of a desired distance; a second established - test pattern with two sets of line / distance - patterns, which in each case in a symmetrical manner on the upper and lower sections of the second test pattern established - are formed, wherein each of the line / distance - sets of a plurality of line / distance - patterns, which consists of a first pair of line / distance - patterns with different lengths and a second pair of..
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