A method for determining statistical fluctuations of values of geometric properties of for the production of semiconductor components necessary structures

摘要

There are input parameters (f; d) and these associated technically possible parameter values (fi; d.sub.j) is selected, from which support point values (b) and the associated resulting values (cdk) for the geometric properties (cd) are obtained. At each support point value (b), the respective result value (cdk) the the respective support point value (b) associated parameter value (fi; d.sub.j) associated with. On the result values (cdk), in the entire area of the associated parameter values (fi; d.sub.j) a "response surface " (rs), adapted to the resulting in response - values (rv), for the in partial areas (urs) a minimum value (rvmin) and a maximum value (rvmax) are determined. From the largest (rvmaxmax) and the overall smallest (rvminmin) response - value (rv), a total interval (ivges) is formed, which in a given number of part - intervals (ivt) is divided. For each of the part - intervals (ivt), the individual probabilities added together, resulting in a total probability value for a respective part - interval (ivt) over all values - intervals (iv), supplies.