Direct-write lithography method for forming sub-micrometer structure, e.g. photonic crystals, by interpolating layout data in-situ and selecting dose modulation to give exposure of circular areas by proximity effect

摘要

Only the characteristic layout data of the borders of a rectangular area are stored in a storage medium for control of an electron beam. The remaining layout data are interpolated in-situ, and the dose modulation of the electron beam when directly writing the rectangular areas in relation to circular areas to be formed is selected so that a specific overexposure leads to exposure of circular areas by the proximity effect.