Manufacturing optical imaging system, especially microlithography protection objective, involves computing wavefront error correction surface topography/refractive index distribution

摘要

The method involves assembling the system with essentially positionally correct optical elements, positionally-resolved determination of the wavefront in the outlet pupil or a conjugated surface, computing the topography and/or refractive index distribution of at least one surface for correcting the wavefront error, processing the correction surface to correct the error and fitting the element with the correction surface. The method involves assembling the system with essentially positionally correct arrangement of the optical elements, measuring the system with positionally-resolved determination of the wavefront in the outlet pupil or a conjugated surface, selecting at least one correction surface near the outlet pupil or conjugated surface, computing the topography and/or refractive index distribution of at least one correction surface for correcting the wavefront error, processing the correction surface to correct the error and fitting the element with the correction surface. An independent claim is also included for the following: (a) an optical imaging system, especially a microlithography protection objective.