首页> 外国专利> New 2-(1-((hetero)aryl(oxy))-ethyl)-nitrobenzene derivatives, useful for introducing intramolecular triplet sensitized photolabile protecting groups into synthons for light-controlled biopolymer production

New 2-(1-((hetero)aryl(oxy))-ethyl)-nitrobenzene derivatives, useful for introducing intramolecular triplet sensitized photolabile protecting groups into synthons for light-controlled biopolymer production

机译:新的2-(1-(((杂)芳基(氧基))-乙基)-硝基苯衍生物,可用于将分子内三重态敏化的光不稳定保护基引入合成子中,以控制光控生物聚合物的生产

摘要

2-(1-((Hetero)aryl or (hetero)aryloxy)-ethyl)-nitrobenzene derivatives (I) are new. Also new are nucleotide synthon compounds (II) containing a photolabile protecting group derived from (I). Nitrobenzene derivatives of formula (I) are new. R1 = halo, CN or NO2; or alkyl, alkenyl, alkynyl, alkoxy, alkoxycarbonyl, aryl, aryloxy, heteroaryl or heteroaryloxy (all optionally substituted, aryl or heteroaryl moieties being mono- or polycyclic); or adjacent groups R1 may together form a 5- or 6-membered ring (optionally containing heteroatoms); R2 = mono- or polycyclic aryloxy or heteroaryloxy; or polycyclic aryl or heteroaryl containing at least 3 fused rings; R3 = trialkylsilyl; or alkyl, alkenyl, alkynyl, alkoxy, alkoxycarbonyl, aryl, aryloxy, heteroaryl or heteroaryloxy (all optionally substituted, aryl or heteroaryl moieties being mono- or polycyclic); m = 0-4; p = 0 or 1; X = -C(O)-, -O-C(O)-, -O-C(S)- or -S(O)2-; and Y = H, leaving group or substrate. An Independent claim is included for new protected synthons (II) for the production of biopolymers, where (II) contain at least one photolabile protective group obtained by reaction of the parent synthon with (I) to cause substitution of Y.
机译:2-(1-((杂)芳基或(杂)芳氧基)-乙基)-硝基苯衍生物(I)是新的。同样新的是含有衍生自(I)的光不稳定保护基的核苷酸合成子化合物(II)。式(I)的硝基苯衍生物是新的。 R1 =卤素,CN或NO2;或烷基,烯基,炔基,烷氧基,烷氧基羰基,芳基,芳氧基,杂芳基或杂芳氧基(所有任选取代的芳基或杂芳基部分为单环或多环);或或相邻的基团R 1可以一起形成5或6元环(任选地包含杂原子); R 2 =单或多环芳氧基或杂芳氧基;或含有至少3个稠环的多环芳基或杂芳基; R3 =三烷基甲硅烷基;或烷基,烯基,炔基,烷氧基,烷氧基羰基,芳基,芳氧基,杂芳基或杂芳氧基(所有任选取代的芳基或杂芳基部分为单环或多环);或m = 0-4; p = 0或1; X = -C(O)-,-O-C(O)-,-O-C(S)-或-S(O)2-; Y = H,离开基团或底物。对用于生产生物聚合物的新的受保护的合成子(II)包括独立权利要求,其中(II)包含至少一个通过母体合成子与(I)反应引起Y取代而获得的光不稳定保护基。

著录项

  • 公开/公告号DE10260592A1

    专利类型

  • 公开/公告日2004-07-01

    原文格式PDF

  • 申请/专利权人 FEBIT AG;

    申请/专利号DE2002160592

  • 申请日2002-12-23

  • 分类号C07H19/00;C07H21/00;C07B51/00;C07C205/19;C07C205/34;C07D213/02;C07D235/00;C07D249/02;C07D257/04;C07H15/26;C07K1/06;B01J19/12;

  • 国家 DE

  • 入库时间 2022-08-21 22:43:36

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