bestrahlungsanordnung and method for the treatment of acne and acne scarred

摘要

The radiation system can produce optical pulses on the surface in treatment (7) with radiation power at optical pulse peak between l W/cm2 and 100 kW/cm2. Pulse energy lies between 0.05 and 10 J/cm2 and the radiation source (2) can operate in pulses of 10-250 ms at frequency 0.0010-1000 Hz. The preferred source is an Xe flash with UV suppressor or transfer equipment, also for suppressing undesirable spectral components in the range of interest. The source is allocated a silicon-elastomer fluorescent film (8) doped with inorganic fluorescent particles.