entladungsplasma - bearbeitungsanlage with magnetic neutral line

摘要

the present invention provides a entladungsplasma - bearbeitungsanlage with magnetic neutral line, the magnetic neutral line at the same time, with several entladungsplasmen can use to gleichf & all; rmig total fl & auml; che a big and white and rectangular substrate of ho mogenit & auml; t due to editing.the steuerungsfeld producing means of entladungsplasma - bearbeitungsanlage with magnetic neutral line have at least two linear stromst & auml; be on the ow & w; outside the vacuum chamber in parallel with the access to oberfl & auml; che of the bearbeitungsobjekts in the vacuum chamber so as to be waitingat least one linear magnetic neutral line in the vacuum chamber between adjacent angeordnenten linear stromst & auml; ben to form (fig. 2).