首页> 外国专利> Phenolic resin, useful for the production of epoxy resin systems for the encapsulation of semi-conductor devices, is prepared by reaction of an aromatic dihydroxyl compound with a phenol compound

Phenolic resin, useful for the production of epoxy resin systems for the encapsulation of semi-conductor devices, is prepared by reaction of an aromatic dihydroxyl compound with a phenol compound

机译:酚醛树脂可通过芳族二羟基化合物与酚类化合物的反应制备,可用于生产用于封装半导体器件的环氧树脂体系

摘要

A phenolic resin is prepared by reaction of an aromatic dihydroxyl compound with a phenol compound whereby the compound is terminated by structural units originating from the phenol compound and has a mol. wt. comprising the total mol. wt. of 2 moles of dihydroxyl compound and 3 moles of phenol compound minus the mol. wt. of 4 moles as analyzed by HPLC. A phenolic resin (I) is prepared by reaction of a dihydroxyl compound of formula (1) with a phenol compound whereby the compound (a) has a peak area of 90-100% (with respect to the total peak area) when measured by high performance liquid chromatography (HPLC) using a UV-detector (220 nm) and the compound (a) has a molecular structure terminated by structural units originating from the phenol compound, a mol. wt. comprising the total mol. wt. of 2 moles of dihydroxyl compound and 3 moles of phenol compound minus the mol. wt. of 4 moles of water and compound (b) has a molecular structure terminated by structural units originating from the phenol compound, a mol. wt. comprising the total mol. wt. of 2 moles of dihydroxyl compound and 2 moles of phenol compound minus the mol. wt. of 4 moles of water. Ar = 6-20C aromatic; R1-R4 = H, 1-20C alkyl, 5-20C cycloalkyl or 7-20 C aralkyl with the proviso that not both R1 and R3 and H and not both R2 and R4 are H Independent claims are included for: (1) a process for the production of the phenolic resin (I) by partial dehydration of the dihydroxyl compound followed by reaction with the phenol compound in a molar ratio of 40:100-90:100; (2) an epoxy resin (II) prepared by glycidyl etherification of the phenol resin (I); (3) an epoxy resin composition (III) prepared by mixing the epoxy resin (II), a hardener having hydroxyphenol groups and inorganic filler; (4) an encapsulated semiconductor device prepared by hardening of the composition (III).
机译:通过使芳族二羟基化合物与酚化合物反应来制备酚醛树脂,其中该化合物被源自酚化合物的结构单元封端并且具有摩尔。重量包括总摩尔。重量2摩尔的二羟基化合物和3摩尔的酚化合物减去摩尔。重量通过HPLC分析得到4摩尔。酚醛树脂(I)是通过使式(1)的二羟基化合物与酚化合物反应而制备的,其中化合物(a)的峰面积在90℃下为90-100%(相对于总峰面积)。使用UV检测器(220 nm)的高效液相色谱(HPLC),化合物(a)的分子结构被源自酚化合物mol的结构单元终止。重量包括总摩尔。重量2摩尔的二羟基化合物和3摩尔的酚化合物减去摩尔。重量1摩尔的水和4摩尔的化合物(b)的分子结构被源自酚化合物的结构单元(1摩尔)终止。重量包括总摩尔。重量2摩尔的二羟基化合物和2摩尔的酚化合物减去摩尔。重量4摩尔水。 Ar = 6-20C芳香族; R1-R4 = H,1-20C烷基,5-20C环烷基或7-20 C芳烷基,条件是R1和R3和H都不都是,R2和R4都不都是H:(1)通过使二羟基化合物部分脱水,然后以40:100-90:100的摩尔比与酚化合物反应来制备酚醛树脂(I)的方法; (2)通过酚醛树脂(I)的缩水甘油醚化而制备的环氧树脂(II)。 (3)通过混合环氧树脂(II),具有羟基酚基的固化剂和无机填充剂而制备的环氧树脂组合物(III)。 (4)通过硬化组合物(III)制备的封装的半导体器件。

著录项

  • 公开/公告号DE10326536A1

    专利类型

  • 公开/公告日2004-02-26

    原文格式PDF

  • 申请/专利权人 SUMITOMO CHEMICAL CO. LTD.;

    申请/专利号DE2003126536

  • 发明设计人 SAITO NORIAKI;NAGASHIMA TOHRU;

    申请日2003-06-12

  • 分类号C08G61/02;C08G59/04;

  • 国家 DE

  • 入库时间 2022-08-21 22:43:19

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号