Process for the photolithographic micro-structuring of three-dimensional surfaces used in micro-electronics comprises carrying out conformal surface coating with a droplet mist made from photosensitive lacquer

摘要

Process for the photolithographic micro-structuring of three-dimensional surfaces comprises carrying out conformal surface coating with a droplet mist made from photosensitive lacquer of a defined consistency and droplet size, carrying out measures to compensate for image errors as a result of very low sharpness depths, and meeting measures for suppressing unwanted reflections and scattered light during the exposure process. An independent claim is also included for a micro-technical arrangement for carrying out the process.